Cooling Water Cabinets

Cooling Water Cabinets

Usage of ultra-pure-water (UPW) in the tool circuit.

Environmental Control Chamber

Precise Environmental Chamber

Precise environmental chamber for controlled process environments.
 

precision climate control system

Precision Climate-Control System

The right climate ensures quality and reduces the rejection rate in production. 
Dew Point Control System

Dew Point Control Solution

System solution for the dew point control of critical humidity production.

ultrapure water conditioning systems

Ultrapure Water Conditioning

Precise conditioning of fluid media at innovative production environments.

cleanroom employees at work image

Cleanroom

Superior solutions and comprehensive services

mini environments image

Mini Environments

air handling unit

Air Handling Units

critical-subsystems-and-controlled-environments-hero-image-dark2

Critical Subsystems and Controlled Environments

High Purity Gas Supply-Systems

Gas Supply

chemical supply machinery

Chemical Supply

Ultra-high purity chemical & slurry blending and distribution systems

liquid level sensor image

Ampoules and Sensors

process exhaust ductwork, piping and supports

Process Exhaust

Exentec Gas Abatement Technology image - formerly Airgard

Gas Abatement

bioprocessing equipment skid image

Biopharma Solutions

CELERA Manual Wet Bench hero image

Wet Benches

We specialize in designing surface preparation systems where application requirements and equipment performance align seamlessly

Our tools integrate process hardware, advanced control software, and automated robotics to deliver customized solutions from manual single-process benches to fully automated wafer handling systems.We can customize substrate carriers and end effectors to accommodate unique processing requirements.

We support a wide range of substrates and materials:

  • Wafers (100mm – 300mm)
  • III-V semiconductor materials
  • Photomasks
  • Glass and quartz fixtures
  • Custom manifolds and specialty carriers 

Our engineers can also design custom end effectors and substrate carriers to meet your specific process and handling needs. 

  • Cleaning, resist strips, etching, development, metal lift-off, IPA recovery and drying 
  • Usable for acid, base and solvent applications 
  • Single or multi-cassette bath sizes 
  • Configurable and scalable process equipment.  

Our team has experience with a wide range of application needs including work in FEOL, BEOL, Advanced Packaging, MEMS Pattern Plating, Magnetic Deposition, Electro-Etch, and E-less Deposition. We also have standard wet process bath layouts available for many applications such as: 

  • Wet Etching – Silicon (KOH) etch, Nitride etch, buffered oxide etch, photoresist strip, and gold/platinum etch. 
  • Metal Lift-Off – NMP and DMSO configurations 
  • Wafer Clean – Support for HF, Piranha, SC1, SC2 baths 


Our process tools can be configured with a complete range of support systems to enhance automation, safety, and chemical management: 

  • Chemical Handling Systems 
  • Chemical carts for dispense, removal, and storage 
  • Onboard carboys for waste collection 
  • Lift stations for waste neutralization 
  • Process Optimization Hardware 
  • Temperature-controlled circulators (WHRV) 
  • Heating: up to 5115 BTU/hr 
  • Cooling: up to 2550 BTU/hr 
  • Recirculating baths for consistent temperature and flow 
  • Quartz tanks for chemical resistance 
  • Quick Dump Rinsers (QDR) 
  • Immersion, cascade, and spray modes 

Our  surface preparation systems are scalable and ready for integration into cleanrooms, R&D labs, and high-volume fabs. Whether you're working with standard substrates or unique materials, our team can deliver a process-ready platform tailored to your needs.

Mega Proqual with a grey overlay

Slurry Systems

Our tools integrate process hardware, advanced control software, and automated robotics to deliver customized solutions from manual single-process benches to fully automated wafer handling systems.We can customize substrate carriers and end effectors to accommodate unique processing requirements.

We support a wide range of substrates and materials:

  • Wafers (100mm – 300mm)
  • III-V semiconductor materials
  • Photomasks
  • Glass and quartz fixtures
  • Custom manifolds and specialty carriers 

Our engineers can also design custom end effectors and substrate carriers to meet your specific process and handling needs. 

  • Cleaning, resist strips, etching, development, metal lift-off, IPA recovery and drying 
  • Usable for acid, base and solvent applications 
  • Single or multi-cassette bath sizes 
  • Configurable and scalable process equipment.  

Our team has experience with a wide range of application needs including work in FEOL, BEOL, Advanced Packaging, MEMS Pattern Plating, Magnetic Deposition, Electro-Etch, and E-less Deposition. We also have standard wet process bath layouts available for many applications such as: 

  • Wet Etching – Silicon (KOH) etch, Nitride etch, buffered oxide etch, photoresist strip, and gold/platinum etch. 
  • Metal Lift-Off – NMP and DMSO configurations 
  • Wafer Clean – Support for HF, Piranha, SC1, SC2 baths 


Our process tools can be configured with a complete range of support systems to enhance automation, safety, and chemical management: 

  • Chemical Handling Systems 
  • Chemical carts for dispense, removal, and storage 
  • Onboard carboys for waste collection 
  • Lift stations for waste neutralization 
  • Process Optimization Hardware 
  • Temperature-controlled circulators (WHRV) 
  • Heating: up to 5115 BTU/hr 
  • Cooling: up to 2550 BTU/hr 
  • Recirculating baths for consistent temperature and flow 
  • Quartz tanks for chemical resistance 
  • Quick Dump Rinsers (QDR) 
  • Immersion, cascade, and spray modes 

Our  surface preparation systems are scalable and ready for integration into cleanrooms, R&D labs, and high-volume fabs. Whether you're working with standard substrates or unique materials, our team can deliver a process-ready platform tailored to your needs.