

Cleanroom
Superior solutions and comprehensive services
We develop, produce and maintain reliable cleanroom products and production environments for ultra-clean controlled atmospheres.

Mini Environments
In the battery market, Exentec pioneers a unique modular Mini Environment concept, integrating energy reduction and technological improvements.

Air Handling Units
Air Handling Units from Exentec are distinguished by energy-efficient design. Our research and development team works with state-of-the art equipment and always contributes the latest knowledge.

Critical Subsystems and Controlled Environments
Pure media supply systems for sensitive products


Chemical Supply
Ultra-high purity chemical & slurry blending and distribution systems
Ultra-high purity chemical & slurry blending and distribution systems

Ampoules and Sensors
We manufacture liquid level sensors, pyrophoric chemical handling and DOT 4B ampoules, cylinders and canisters widely used in the semiconductor, photovoltaic and battery industries.

Process Exhaust
We set the industry standard for safe and reliable corrosive fume exhaust duct systems
Gas Abatement
We are a supplier of choice for major semiconductor companies around the world, providing Point-of-Use (POU) gas abatement solutions for deposition, etch and diffusion process tools.


Wet Benches
We specialize in designing surface preparation systems where application requirements and equipment performance align seamlessly
Our tools integrate process hardware, advanced control software, and automated robotics to deliver customized solutions from manual single-process benches to fully automated wafer handling systems.We can customize substrate carriers and end effectors to accommodate unique processing requirements.
We support a wide range of substrates and materials:
- Wafers (100mm – 300mm)
- III-V semiconductor materials
- Photomasks
- Glass and quartz fixtures
- Custom manifolds and specialty carriers
Our engineers can also design custom end effectors and substrate carriers to meet your specific process and handling needs.
- Cleaning, resist strips, etching, development, metal lift-off, IPA recovery and drying
- Usable for acid, base and solvent applications
- Single or multi-cassette bath sizes
- Configurable and scalable process equipment.
Our team has experience with a wide range of application needs including work in FEOL, BEOL, Advanced Packaging, MEMS Pattern Plating, Magnetic Deposition, Electro-Etch, and E-less Deposition. We also have standard wet process bath layouts available for many applications such as:
- Wet Etching – Silicon (KOH) etch, Nitride etch, buffered oxide etch, photoresist strip, and gold/platinum etch.
- Metal Lift-Off – NMP and DMSO configurations
- Wafer Clean – Support for HF, Piranha, SC1, SC2 baths
Our process tools can be configured with a complete range of support systems to enhance automation, safety, and chemical management:
- Chemical Handling Systems
- Chemical carts for dispense, removal, and storage
- Onboard carboys for waste collection
- Lift stations for waste neutralization
- Process Optimization Hardware
- Temperature-controlled circulators (WHRV)
- Heating: up to 5115 BTU/hr
- Cooling: up to 2550 BTU/hr
- Recirculating baths for consistent temperature and flow
- Quartz tanks for chemical resistance
- Quick Dump Rinsers (QDR)
- Immersion, cascade, and spray modes
Our surface preparation systems are scalable and ready for integration into cleanrooms, R&D labs, and high-volume fabs. Whether you're working with standard substrates or unique materials, our team can deliver a process-ready platform tailored to your needs.

Slurry Systems
Our tools integrate process hardware, advanced control software, and automated robotics to deliver customized solutions from manual single-process benches to fully automated wafer handling systems.We can customize substrate carriers and end effectors to accommodate unique processing requirements.
We support a wide range of substrates and materials:
- Wafers (100mm – 300mm)
- III-V semiconductor materials
- Photomasks
- Glass and quartz fixtures
- Custom manifolds and specialty carriers
Our engineers can also design custom end effectors and substrate carriers to meet your specific process and handling needs.
- Cleaning, resist strips, etching, development, metal lift-off, IPA recovery and drying
- Usable for acid, base and solvent applications
- Single or multi-cassette bath sizes
- Configurable and scalable process equipment.
Our team has experience with a wide range of application needs including work in FEOL, BEOL, Advanced Packaging, MEMS Pattern Plating, Magnetic Deposition, Electro-Etch, and E-less Deposition. We also have standard wet process bath layouts available for many applications such as:
- Wet Etching – Silicon (KOH) etch, Nitride etch, buffered oxide etch, photoresist strip, and gold/platinum etch.
- Metal Lift-Off – NMP and DMSO configurations
- Wafer Clean – Support for HF, Piranha, SC1, SC2 baths
Our process tools can be configured with a complete range of support systems to enhance automation, safety, and chemical management:
- Chemical Handling Systems
- Chemical carts for dispense, removal, and storage
- Onboard carboys for waste collection
- Lift stations for waste neutralization
- Process Optimization Hardware
- Temperature-controlled circulators (WHRV)
- Heating: up to 5115 BTU/hr
- Cooling: up to 2550 BTU/hr
- Recirculating baths for consistent temperature and flow
- Quartz tanks for chemical resistance
- Quick Dump Rinsers (QDR)
- Immersion, cascade, and spray modes
Our surface preparation systems are scalable and ready for integration into cleanrooms, R&D labs, and high-volume fabs. Whether you're working with standard substrates or unique materials, our team can deliver a process-ready platform tailored to your needs.