Designed to support a wide range of high-tech industries
Including CMP, silicon carbide, LEDs, solar, and optics, these systems deliver exceptional flexibility, high accuracy, and reliable performance in a compact footprint. With flexible makeup rates, real-time process monitoring, and customizable configurations, MEGA® systems are optimized for semiconductor fabrication, low-solids CMP applications, and more.
Enhance your slurry processing system today.
System at a glance: highlighted features
System at a glance: highlighted features
- Flexible Operation
- Supports low- to high-volume specialty chemical processes
- Adjustable point-of-use dispense pressures for diverse tool requirements
- Scalable & Configurable Design
- Multiple system models tailored to specific fab and cleanroom layouts
- Customizable options for both new and retrofitted facilities
- Proven Reliability
- Designed for high-throughput manufacturing environments
- Low total cost of ownership with robust system performance
Key benefits
Key benefits
- Scalable architecture supports expansion as production requirements grow
- Compatible with multiple Ethernet-based protocols and legacy interfaces
- Operates as a standalone PLC system or integrates easily into existing SCADA infrastructure
- Redundant power, communications, and control logic improve uptime and operational security
- Designed for CMP fabs, slurry systems, and chemical delivery across global loop networks
Options
Options
- Redundant AC power supply
- Redundant communication links
- Redundant Programmable Logic Controllers (PLCs) for failover protection
Suitable applications
Suitable applications
- CMP slurry distribution systems (small and large-scale fabs)
- Global loop chemical supply systems
- Multi-point tool communication networks
- Chemical or gas cabinet monitoring
- Process control interface for legacy and modern tool integration