Advanced slurry titration systems

MEGA® Metrology Systems deliver precision measurement and monitoring solutions for slurry and chemical processes in semiconductor, CMP, solar, LED, and emerging technologies. Designed for maximum reliability and accuracy, our systems provide critical data for particle size analysis, chemical concentration control, and process optimization to help maximize product yield and process stability. 

The MEGA® SA100 Series is an advanced slurry titration system that enables precise, automated analysis of chemical concentration in real-time. Designed to passively sample from chemical or slurry systems, the SA100 improves yield and ensures chemical consistency through intelligent feedback and (optional) closed-loop replenishment control.

The MEGA® SA200 Series provides high-accuracy particle characterization and monitoring, ideal for quality control of slurry blends, raw materials, and filter performance. With integrated dilution control, flush mechanisms, and advanced particle counting sensors, the SA200 protects your process from wafer scratching, yield excursions, and batch variability.

The MEGA® Metrology Cart is a compact, mobile slurry analysis tool engineered for real-time particle size and count measurement at the point-of-use. Ideal for CMP slurry evaluation, R&D, and filter performance validation, the cart supports advanced dilution control, optional pH adjustment, and customizable sensor configurations—ensuring high-precision metrology wherever it’s needed.

SA100 distribution
MEGA® SA100 series features
MEGA® SA100 series features

  • Online, quantitative concentration monitoring
  • Up to 6 slipstreams (same chemistry) for multi-point analysis of multiple systems
  • Programmable recipes for sampling, purging, and constituent replenishment Specific assays and electrochemical sensors for accurate, targeted measurement
  • Built-in automatic flush/purge with Di or Peroxide with manual override
  • Pressurized sampling from tool sources
  • Segregated chemical and electrical compartments
  • Emergency machine off (E.M.O.), audible/visual alarms, and leak detection
  • SEMI S2 compliance and system exhaust verification 
     

SA100 metrology diagram
MEGA® SA100 series benefits
MEGA® SA100 series benefits

  • Increase product yield by accurately maintaining process chemical composition
  • Monitor chemical degradation across the full product lifecycle
  • Rapid detection and correction of process variations
  • Minimize batch loss risk with real-time chemical insight
  • 99.9% system availability ensures reliable uptime
  • Controlled directly from the blend system (no external PLC required) 

MEGA chemical distribution machine
MEGA® SA100 series applications
MEGA® SA100 series applications

  • Semiconductor Fabrication
  • Post-CMP Slurry Monitoring
  • Solar/PV Manufacturing
  • Low-Solids CMP Processes
  • LED & Silicon Carbide (SiC) Production
  • Aerospace & ECD (Electrochemical Deposition)
  • IoT Device Manufacturing SA100 Series – High-Accuracy Slurry Titration & Chemical Analytics

SA200 chemical metrology system
MEGA® SA200 series features
MEGA® SA200 series features

  • Particle size detection from 0.2μm to 20μm (configuration-dependent)
  • Adjustable particle size binning for granular data
  • Supports up to 1,000,000:1 dilution (dual-stage)
  • Multiple sensor options and in-series configurations for verification
  • Long-term batch and filter performance monitoring
  • Accepts grab samples or continuous sampling
  • Manual dilution and flush controls with DI or chemical options
  • Constructed of chemical-resistant PFA plastics and 316 SS flow meters
  • Optional FM 4910 or WPP-compliant enclosures