CELERA Manual Wet Bench

With an open process area that mirrors the decktop configuration of larger wet benches and integrated laminar airflow, the CELERA system minimizes particle and fume contamination—making it ideal for research, development, and pilot-line environments.

Key Benefits

• Modular Design – Fully customizable tank layouts and material configurations
• Contamination Control – Laminar airflow over the decktop for a clean process environment
• Lab-Scale Efficiency – Manual and semi-automated options reduce downtime and improve throughput
• Flexible Substrate Support – From 100mm to 300mm wafers and custom substrates

CELERA® benches are the ideal manual or semi-automated wet processing solution for semiconductor R&D, materials science, and other clean-critical applications—balancing performance, flexibility, and safety in one compact system.

The system at a glance - Highlighted Features

• 100mm to 300mm wafers plus custom substrates
• Surface preparation and plating applications
• Front and rear access configuration options
• Support any chemical or substrate size
• Polypropylene, PVC - FM4910 or Stainless Steel
• Semi-Automated - Front-to-back robots or mechanical agitation
• Bath Recirculation / Filtration - High temperature and ambient processes
• Megasonic/Ultrasonic tanks - Particle and thick residue removal
• Bath spiking - Hydrogen peroxide, D.I. water & Additional Additives
• Microprocessor based controls or PLC based controls with HMI touch screen
• Casters with leg adjusters

Options

• FM 4910 Approved Building Materials
• Custom drains and chemical handling accessories (carboys, bottles, etc)
• FM-tested C2 fire detection and extinguishing system
• SEMI and CE Mark or other third party NRTL testing and certification
• HEPA/ULPA air filtration