Designed for legacy and next-gen applications
Engineered to meet the demanding requirements of semiconductor manufacturing CMP applications, and other high-purity chemical processes, these systems support a wide range of blend ratios and makeup rates—making it ideal for both legacy and next-generation applications.
Designed for total reliability and repeatability, MEGA® blending systems offer automated control, intelligent monitoring, and customizable tank capacities to meet the specific demands of each process environment.