The spectrum of Exentec surface preparation tools and wet benches ranges from batch immersion to spray or single-wafer application wet benches. All wet benches can be configured from manual to fully automated multitasking systems.
Our wet benches are designed for repeatability and volume, with an emphasis on processes with two or more processing tanks. Built to current SEMI standards, our wet process stations are available in fully automated, semi-automated and manual configurations.
- FEOL, BEOL, Packaging modules, Advance Packaging modules, MEMS Pattern Plating, Magnetic Deposition, Electro-Etch, and E-less Deposition
- Cleaning, resist strips, etching, development, metal lift-off, IPA recovery and drying
- Usable for acid, base and solvent applications
- Single or multi-cassette bath sizes
- Silicon wafers from 100mm to 450mm, III-V materials, photomasks, glass and large manifolds
- Customized substrates
Aeris Automated Wet Bench
Our Aeris® Automated Wet Bench is engineered specifically for the rigorous demands of semiconductor research and development, combining high-performance processing with the flexibility and safety modern labs require.
CELERA® manual wet benches
CELERA® manual wet benches are engineered to deliver high-performance wet processing at a lab scale, offering modularity and robust design inspired by fully automated systems.
Chemical supply and dosing systems
Our configurable Chemical Transfer and Dispense Modules (CTDM) are engineered for ultra-pure chemical delivery, precision dosing, and safe distribution to production tools—making them ideal for semiconductor fabrication, cleanroom environments, and other high-purity process applications.
Fume hoods
Protect your lab environment with Exentec high-performance fume hoods, engineered for lab-scale applications where containment of hazardous fumes is critical.
Wet process support equipment
At Exentec, we specialize in designing surface preparation systems where application requirements and equipment performance align seamlessly.